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Fabrication of high-aspect-ratio silicon nanopillar arrays with the conventional reactive ion etching technique

✍ Scribed by Y.-F. Chang; Q.-R. Chou; J.-Y. Lin; C.-H. Lee

Publisher: Springer
Year: 2006
Tongue: English
Weight: 384 KB
Volume: 86
Category: Article
ISSN: 1432-0630
DOI: 10.1007/s00339-006-3748-0

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