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Fabricating high-aspect-ratio sub-diffraction-limit structures on silicon with two-photon photopolymerization and reactive ion etching

✍ Scribed by C.-H. Lee; T.-W. Chang; K.-L. Lee; J.-Y. Lin; J. Wang

Publisher: Springer
Year: 2004
Tongue: English
Weight: 255 KB
Volume: 79
Category: Article
ISSN: 1432-0630
DOI: 10.1007/s00339-003-2423-y

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