✦ LIBER ✦
Trilevel reactive ion etching processes for fabrication of 60 nm germanium structures with high aspect ratio: Matthies, T.; David, C.; Thieme, J. Journal of Vacuum Science & Technology B (Microelectronics Processing and Phenomena). 1993 Sep
- Publisher
- Elsevier Science
- Year
- 1994
- Tongue
- English
- Weight
- 112 KB
- Volume
- 16
- Category
- Article
- ISSN
- 0141-6359
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