Fabrication of high-aspect-ratio sub-diffraction-limit microstructures by two-photon-absorption photopolymerization

✍ Scribed by E.-Y. Pan; N.-W. Pu; Y.-P. Tong; H.-F. Yau

• Publisher: Springer
• Year: 2003
• Tongue: English
• Weight: 151 KB
• Volume: 77
• Category: Article
• ISSN: 0721-7269
• DOI: 10.1007/s00340-003-1283-7