✦ LIBER ✦

ITO dry-etching mechanism and its application in the fabrication of LCDs

✍ Scribed by H. Takei; Y. Yasui; K. Mizuno; S. Sakio; S. Ishibashi

No coin nor oath required. For personal study only.

📜 SIMILAR VOLUMES

The application of secondary effects in

✍ B.E. Volland; H. Heerlein; I. Kostic; I.W. Rangelow 📂 Article 📅 2001 🏛 Elsevier Science 🌐 English ⚖ 703 KB

Plasma Etching of Poly(dimethylsiloxane)

✍ Vlachopoulou, Maria-Elena; Kokkoris, George; Cardinaud, Christophe; Gogolides, E 📂 Article 📅 2012 🏛 John Wiley and Sons 🌐 English ⚖ 800 KB

Etching submicrometer trenches by using

✍ Chang, Chienliu; Wang, Yeong-Feng; Kanamori, Yoshiaki; Shih, Ji-Jheng; Kawai, Yu 📂 Article 📅 2005 🏛 Institute of Physics 🌐 English ⚖ 903 KB

Selective etching of n-type silicon in p

✍ Wang, Huiquan; Jin, Zhonghe; Zheng, Yangming; Ma, Huilian; Li, Tie; Wang, Yuelin 📂 Article 📅 2008 🏛 Institute of Physics 🌐 English ⚖ 380 KB

Fabrication of template with dual-scale

✍ Song, Yixiong; Wang, Quandai; Xiao, Jiming; Wang, Li 📂 Article 📅 2014 🏛 The Institution of Engineering and Technology 🌐 English ⚖ 460 KB

Fabrication of through substrate grooves

✍ Wang, S. F.; Han, M.; Ye, J. T.; Xu, G. W.; Luo, L. 📂 Article 📅 2013 🏛 Springer-Verlag 🌐 English ⚖ 631 KB