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Etching submicrometer trenches by using the Bosch process and its application to the fabrication of antireflection structures

✍ Scribed by Chang, Chienliu; Wang, Yeong-Feng; Kanamori, Yoshiaki; Shih, Ji-Jheng; Kawai, Yusuke; Lee, Chih-Kung; Wu, Kuang-Chong; Esashi, Masayoshi


Book ID
121216691
Publisher
Institute of Physics
Year
2005
Tongue
English
Weight
903 KB
Volume
15
Category
Article
ISSN
0960-1317

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