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A new technique for fabrication of OEICs-the etched back planar process-and its application to the fabrication of planar embedded InP-InGaAs p-i-n photodiodes

✍ Scribed by Shimizu, J.; Inomoto, Y.; Kida, N.; Terakado, T.; Suzuki, A.


Book ID
119786295
Publisher
IEEE
Year
1990
Tongue
English
Weight
213 KB
Volume
2
Category
Article
ISSN
1041-1135

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