The procedure used to produce htgh qualily V3Si superconducling hlms ts descrtbed. Resulls are reporled Ior hires oblained by Ihermal anneahng under vacuum ol a lew vanadium and sil,con layers sequenl,ally deposiled by eleclron-bearn evaporalion. 'Resislwe' crtltcal lemperalures up Io 16.2 K wilh ve
β¦ LIBER β¦
Temperature dependence of resistivity for thermally diffused V3Si multilayer films
β Scribed by A. Chiara; U. Scotti di Uccio; M. Senatore; L. Maritato
- Publisher
- Springer US
- Year
- 1986
- Tongue
- English
- Weight
- 440 KB
- Volume
- 62
- Category
- Article
- ISSN
- 0022-2291
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