Properties of thermally diffused V3Si multilayer films

✍ Scribed by S De Stefano; A Di Chiara; G Peluso; L Maritato; A Saggese; R Vaglio

• Publisher: Elsevier Science
• Year: 1985
• Tongue: English
• Weight: 248 KB
• Volume: 25
• Category: Article
• ISSN: 0011-2275
• DOI: 10.1016/0011-2275(85)90135-3

✦ Synopsis

The procedure used to produce htgh qualily V3Si superconducling hlms ts descrtbed. Resulls are reporled Ior hires oblained by Ihermal anneahng under vacuum ol a lew vanadium and sil,con layers sequenl,ally deposiled by eleclron-bearn evaporalion. 'Resislwe' crtltcal lemperalures up Io 16.2 K wilh very sharp Iransitton widlh (AT,~ ,.... 0.1 K) are observed. The critical lemperalure as a lunclton ol Ihe anneal,ng lemperalure preparalion parameler and normal slale parameters (larlice conslanl, resislance ralio) are shown. Finally Ihe lemperalure dependence of the normal slale res,slwily ,s discussed m Ihe Iramework ol a phenomenological 'shunl-resislor model'.