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Temperature dependence of the X-ray diffuse scattering intensity in V3Si in the temperature range from 8 to 300 K

✍ Scribed by Acad.; Prof. N. N. Sirota; L. P. Polutchankina; N. S. Orlova

Publisher: John Wiley and Sons
Year: 1983
Tongue: English
Weight: 410 KB
Volume: 18
Category: Article
ISSN: 0232-1300
DOI: 10.1002/crat.2170180810

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