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Suppression of interfacial diffusion by a predeposited Hf metal layer on SiO2/Si

โœ Scribed by Ruiqin Tan; Yasushi Azuma; Isao Kojima


Publisher
Elsevier Science
Year
2004
Tongue
English
Weight
141 KB
Volume
222
Category
Article
ISSN
0169-4332

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