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Formation of almost delta-layered nanoparticles in SiO2 thin film on Si substrate by metal negative-ion implantation

✍ Scribed by Junzo Ishikawa; Hiroshi Tsuji; Nobutoshi Arai; Takuya Matsumoto; Kazuya Ueno; Kouichiro Adachi; Hiroshi Kotaki; Yasuhito Gotoh

No coin nor oath required. For personal study only.

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