Nanoparticle formation in 25-nm-SiO2 thin layer by germanium negative-ion implantation and its capacitance–voltage characteristics

✍ Scribed by Hiroshi Tsuji; Nobutoshi Arai; Naoyuki Gotoh; Takashi Minotani; Kenji Kojima; Kouichiro Adachi; Hiroshi Kotaki; Toyotsugu Ishibashi; Yasuhito Gotoh; Junzo Ishikawa

• Publisher: Elsevier Science
• Year: 2007
• Tongue: English
• Weight: 535 KB
• Volume: 257
• Category: Article
• ISSN: 0168-583X
• DOI: 10.1016/j.nimb.2006.12.156