Formation of silver nanoparticles aligned near the bottom of SiO2 film on silicon substrate by negative-ion implantation and post-annealing

✍ Scribed by N. Arai; H. Tsuji; K. Ueno; T. Matsumoto; N. Gotoh; K. Aadachi; H. Kotaki; Y. Gotoh; J. Ishikawa

• Publisher: Elsevier Science
• Year: 2006
• Tongue: English
• Weight: 223 KB
• Volume: 242
• Category: Article
• ISSN: 0168-583X
• DOI: 10.1016/j.nimb.2005.08.018