Formation of self-aligned TiSi2p+−n junctions by implanting BF2+ ions through thin Ti or SiO2 film on Si substrate rapid thermal annealing

✍ Scribed by M.H. Juang; H.C. Cheng

• Publisher: Elsevier Science
• Year: 1992
• Tongue: English
• Weight: 578 KB
• Volume: 35
• Category: Article
• ISSN: 0038-1101
• DOI: 10.1016/0038-1101(92)90094-s