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Submicrometer optical lithography using a double-layer resist by a single development technology

✍ Scribed by Tsuji, K.; Sasago, M.; Kugimiya, K.

Book ID: 114594934
Publisher: IEEE
Year: 1984
Tongue: English
Weight: 884 KB
Volume: 31
Category: Article
ISSN: 0018-9383
DOI: 10.1109/t-ed.1984.21802

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