Process Modeling for Photoresist Development and Design of DLR/sd (Double-Layer Resist by a Single Development) Process

✍ Scribed by Hirai, Y.; Sasago, M.; Masayuki Endo; Tsuji, K.; Mano, Y.

• Book ID: 118698220
• Publisher: IEEE
• Year: 1987
• Tongue: English
• Weight: 930 KB
• Volume: 6
• Category: Article
• ISSN: 0278-0070
• DOI: 10.1109/tcad.1987.1270285