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Study of the redistribution of high dose Sb and P implants in silicon by combination of SIMS and TEM

✍ Scribed by G. Stingeder; M. Grasserbauer; P. Pongratz; W. Kuhnert; I. Wippel; P. Skalicky; E. Guerrero; H. Pötzl

Publisher: John Wiley and Sons
Year: 1988
Tongue: English
Weight: 295 KB
Volume: 12
Category: Article
ISSN: 0142-2421
DOI: 10.1002/sia.740120607

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