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Structural properties of thin silicide layers formed by high-dose metal implantation

✍ Scribed by A. Vantomme; M.F. Wu; G. Langouche; H. Vanderstraeten; Y. Bruynseraede

Publisher: Elsevier Science
Year: 1991
Tongue: English
Weight: 424 KB
Volume: 53
Category: Article
ISSN: 0169-4332
DOI: 10.1016/0169-4332(91)90277-q

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