๐”– Bobbio Scriptorium
โœฆ   LIBER   โœฆ

Stresses in thin nickel silicide films

โœ Scribed by Koos, V. ;Neumann, H.-G.

Publisher
John Wiley and Sons
Year
1975
Tongue
English
Weight
96 KB
Volume
29
Category
Article
ISSN
0031-8965

No coin nor oath required. For personal study only.

๐Ÿ“œ SIMILAR VOLUMES

Effects of stress on the formation and g
Effects of stress on the formation and growth of nickel silicides in Ni thin films on (0 0 1)Si
โœ L.W. Cheng; H.M. Lo; S.L. Cheng; L.J. Chen; C.J. Tsai ๐Ÿ“‚ Article ๐Ÿ“… 2005 ๐Ÿ› Elsevier Science ๐ŸŒ English โš– 602 KB

Effects of stress on the formation and growth of nickel silicides in Ni thin films on (0 0 1)Si have been investigated. Compressive stress induced by backside SiO 2 film on the silicon substrate was found to retard significantly the formation of Ni 2 Si, NiSi and NiSi 2 on (0 0 1)Si. On the other ha