๐”– Bobbio Scriptorium
โœฆ   LIBER   โœฆ

The origins of stress in thin nickel films

โœ Scribed by F.A. Doljack; R.W. Hoffman


Publisher
Elsevier Science
Year
1972
Tongue
English
Weight
214 KB
Volume
12
Category
Article
ISSN
0040-6090

No coin nor oath required. For personal study only.


๐Ÿ“œ SIMILAR VOLUMES


Nanoparticulate origin of intrinsic resi
โœ G. Guisbiers; O. Van Overschelde; M. Wautelet ๐Ÿ“‚ Article ๐Ÿ“… 2007 ๐Ÿ› Elsevier Science ๐ŸŒ English โš– 176 KB

The formation of grains in thin films generates intrinsic residual stress. In this work, we present a model of intrinsic residual stress calculation based on the size-dependent phase transitions of the nanograins. Evaporated thin films are produced by condensation from the vapor on the substrate. It

Stress in vapor-deposited nickel films
โœ A.M. Schwartzman; C. D'Antonio ๐Ÿ“‚ Article ๐Ÿ“… 1968 ๐Ÿ› Elsevier Science ๐ŸŒ English โš– 302 KB
Origin of bias stress induced instabilit
โœ Y. Yan; X.J. She; H. Zhu; S.D. Wang ๐Ÿ“‚ Article ๐Ÿ“… 2011 ๐Ÿ› Elsevier Science ๐ŸŒ English โš– 606 KB

We report a study on the contact resistance instability induced by the bias stress in staggered pentacene thin film transistors, combining the bias stress measurements with the transfer line method. The contact resistance is increasing with the stress time, and two device parameters are found to con