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Strain relaxation in Ge0.09Si0.91epitaxial thin films measured by wafer curvature

✍ Scribed by C. A. Volkert; E. A. Fitzgerald; R. Hull; Y. H. Xie; Y. J. Mii

Book ID: 112819959
Publisher: Springer US
Year: 1991
Tongue: English
Weight: 813 KB
Volume: 20
Category: Article
ISSN: 0361-5235
DOI: 10.1007/bf02665972

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