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Residual strain in Ge films grown by surfactant-mediated epitaxy on Si(1 1 1) and Si(0 0 1) substrates

✍ Scribed by Tobias F. Wietler; Eberhard Bugiel; Karl R. Hofmann


Publisher
Elsevier Science
Year
2006
Tongue
English
Weight
258 KB
Volume
9
Category
Article
ISSN
1369-8001

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