Residual strain in Ge films grown by surfactant-mediated epitaxy on Si(1 1 1) and Si(0 0 1) substrates
β Scribed by Tobias F. Wietler; Eberhard Bugiel; Karl R. Hofmann
- Publisher
- Elsevier Science
- Year
- 2006
- Tongue
- English
- Weight
- 258 KB
- Volume
- 9
- Category
- Article
- ISSN
- 1369-8001
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