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Strain relaxation by pitting in AlN thin films deposited by metalorganic chemical vapor deposition

โœ Scribed by Bryan, I.; Rice, A.; Hussey, L.; Bryan, Z.; Bobea, M.; Mita, S.; Xie, J.; Kirste, R.; Collazo, R.; Sitar, Z.


Book ID
118735244
Publisher
American Institute of Physics
Year
2013
Tongue
English
Weight
899 KB
Volume
102
Category
Article
ISSN
0003-6951

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