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Characteristics of titanium dioxide films deposited by metalorganic chemical vapor deposition

✍ Scribed by D. Wang; M. Wang; X. H. Xu; Y. Hou; H. Wang; H. Han

Book ID: 110339911
Publisher: Springer
Year: 2002
Tongue: English
Weight: 72 KB
Volume: 21
Category: Article
ISSN: 0261-8028
DOI: 10.1023/a:1015644206234

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