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In situ combined synchrotron X-ray diffraction and wafer curvature measurements during formation of thin palladium silicide film on Si(0 0 1) and Si (1 1 1)

✍ Scribed by J. Fouet; M.-I. Richard; C. Mocuta; C. Guichet; O. Thomas

No coin nor oath required. For personal study only.

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In situ combined synchrotron X-ray diffraction and wafer curvature measurements during formation of thin palladium silicide film on Si(0&#xa0;0&#xa0;1) and Si (1&#xa0;1&#xa0;1)