Stacking fault formation in highly doped 4H-SiC epilayers during annealing
β Scribed by Chung, H. J.; Liu, J. Q.; Skowronski, M.
- Book ID
- 120392145
- Publisher
- American Institute of Physics
- Year
- 2002
- Tongue
- English
- Weight
- 487 KB
- Volume
- 81
- Category
- Article
- ISSN
- 0003-6951
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π SIMILAR VOLUMES
A high density of double stacking faults consisting of six Si-C bilayers in cubic stacking sequence could be observed in 4H-SiC crystals with nitrogen doping concentrations exceeding 2 Γ 10 19 cm Γ3 after annealing at temperatures above 1100 1C. The double stacking faults form by glide of two partia
The optical properties of major in-grown stacking faults (IGSFs) in 4H-SiC epilayers have been characterized by micro-photoluminescence (micro-PL) spectroscopy and its intensity mapping. Strong PL emissions from the IGSFs are observed even at room temperature. Three kinds of IGSFs have been identifi