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SPIE Proceedings [SPIE Photomask Technology 2002 - Monterey, CA (Tuesday 1 October 2002)] 22nd Annual BACUS Symposium on Photomask Technology - Model-based OPC using the MEEF matrix

✍ Scribed by Cobb, Nicolas B.; Granik, Yuri; Grenon, Brian J.; Kimmel, Kurt R.

No coin nor oath required. For personal study only.

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