SPIE Proceedings [SPIE Photomask Technology 2002 - Monterey, CA (Tuesday 1 October 2002)] 22nd Annual BACUS Symposium on Photomask Technology - Investigation of reticle defect formation at DUV lithography

✍ Scribed by Bhattacharyya, Kaustuve; Volk, William W.; Grenon, Brian J.; Brown, Darius; Ayala, Javier; Grenon, Brian J.; Kimmel, Kurt R.

• Book ID: 121011489
• Publisher: SPIE
• Year: 2002
• Weight: 397 KB
• Volume: 4889
• Category: Article
• DOI: 10.1117/12.468211