✦ LIBER ✦
SPIE Proceedings [SPIE 27th Annual BACUS Symposium on Photomask Technology - Monterey, CA (Monday 17 September 2007)] Photomask Technology 2007 - Etch proximity correction by integrated model-based retargeting and OPC flow
✍ Scribed by Shang, Shumay; Granik, Yuri; Niehoff, Martin; Naber, Robert J.; Kawahira, Hiroichi
- Book ID
- 120020843
- Publisher
- SPIE
- Year
- 2007
- Weight
- 560 KB
- Volume
- 6730
- Category
- Article
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