SPIE Proceedings [SPIE Photomask 2001 - Monterey, CA (Wednesday 3 October 2001)] 21st Annual BACUS Symposium on Photomask Technology - Understanding the forbidden pitch and assist feature placement

✍ Scribed by Shi, Xuelong; Hsu, Stephen; Chen, J. Fung; Hsu, Chungwei Michael; Socha, Robert J.; Dusa, Mircea V.; Dao, Giang T.; Grenon, Brian J.

• Book ID: 120524056
• Publisher: SPIE
• Year: 2002
• Weight: 583 KB
• Volume: 4562
• Category: Article
• DOI: 10.1117/12.458261