SPIE Proceedings [SPIE Photomask Technology 2005 - Monterey, California (Monday 3 October 2005)] 25th Annual BACUS Symposium on Photomask Technology - The effect of calibration feature weighting on OPC optical and resist models: investigating the influence on model coefficients and on the overall model fitting

✍ Scribed by Abdo, Amr; Fathy, Rami; Madkour, Kareem; Oberschmidt, James; Fischer, Daniel; Talbi, Mohamed; Weed, J. Tracy; Martin, Patrick M.

• Book ID: 120032398
• Publisher: SPIE
• Year: 2005
• Weight: 286 KB
• Volume: 5992
• Category: Article
• DOI: 10.1117/12.631817