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SPIE Proceedings [SPIE Microlithography '99 - Santa Clara, CA (Sunday 14 March 1999)] Optical Microlithography XII - Variable-threshold resist models for lithography simulation

✍ Scribed by Randall, John; Ronse, Kurt G.; Marschner, Thomas; Goethals, Anne-Marie; Ercken, Monique; Van den Hove, Luc

No coin nor oath required. For personal study only.

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