✦ LIBER ✦

SPIE Proceedings [SPIE SPIE's 1996 International Symposium on Microlithography - Santa Clara, CA (Sunday 10 March 1996)] Optical Microlithography IX - Approximate models for resist processing effects

✍ Scribed by Brunner, Timothy A.; Ferguson, Richard A.; Fuller, Gene E.

No coin nor oath required. For personal study only.

📜 SIMILAR VOLUMES

SPIE Proceedings [SPIE SPIE's 1996 Inter

✍ Sethian, James A.; Fuller, Gene E. 📂 Article 📅 1996 🏛 SPIE ⚖ 383 KB

SPIE Proceedings [SPIE SPIE's 1996 Inter

✍ Ronse, Kurt G.; Op de Beeck, Maaike; Yen, Anthony; Kim, Keeho; Van den Hove, Luc 📂 Article 📅 1996 🏛 SPIE ⚖ 848 KB

SPIE Proceedings [SPIE Microlithography

✍ Randall, John; Ronse, Kurt G.; Marschner, Thomas; Goethals, Anne-Marie; Ercken, 📂 Article 📅 1999 🏛 SPIE ⚖ 376 KB

SPIE Proceedings [SPIE SPIE's 1996 Inter

✍ Roeth, Klaus-Dieter; Blaesing-Bangert, Carola; Jones, Susan K. 📂 Article 📅 1996 🏛 SPIE ⚖ 662 KB

SPIE Proceedings [SPIE SPIE's 27th Annua

✍ Malov, Juriy; Kalus, Christian K.; Muellerke, Henning; Schmoeller, Thomas; Wildf 📂 Article 📅 2002 🏛 SPIE ⚖ 826 KB

SPIE Proceedings [SPIE SPIE's 27th Annua

✍ Litt, Lloyd C.; Bourov, Anatoly; La Fontaine, Bruno M.; Apelgren, Eric M.; Yen, 📂 Article 📅 2002 🏛 SPIE ⚖ 114 KB