✦ LIBER ✦

SPIE Proceedings [SPIE SPIE's 1996 International Symposium on Microlithography - Santa Clara, CA (Sunday 10 March 1996)] Optical Microlithography IX - Characterization and optimization of CD control for 0.25-um CMOS applications

✍ Scribed by Ronse, Kurt G.; Op de Beeck, Maaike; Yen, Anthony; Kim, Keeho; Van den Hove, Luc; Fuller, Gene E.

No coin nor oath required. For personal study only.

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