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SPIE Proceedings [SPIE Microlithography '99 - Santa Clara, CA (Sunday 14 March 1999)] Metrology, Inspection, and Process Control for Microlithography XIII - Parameter extraction framework for DUV lithography simulation

✍ Scribed by Jakatdar, Nickhil H.; Bao, Junwei; Spanos, Costas J.; Niu, Xinhui; Bendik, Joseph J.; Hill, Stephen L.; Singh, Bhanwar

No coin nor oath required. For personal study only.

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