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SPIE Proceedings [SPIE Microlithography 2000 - Santa Clara, CA (Sunday 27 February 2000)] Metrology, Inspection, and Process Control for Microlithography XIV - Monte Carlo model of charging in resists in e-beam lithography

✍ Scribed by Ko, Yeong-Uk; Hwu, Justin J.; Joy, David C.; Sullivan, Neal T.

No coin nor oath required. For personal study only.

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