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SPIE Proceedings [SPIE Microlithography 2000 - Santa Clara, CA (Sunday 27 February 2000)] Advances in Resist Technology and Processing XVII - Temperature dependence of acid molecular diffusion in resist polymer films simulated by molecular dynamics

✍ Scribed by Toriumi, Minoru; Okabe, Ichiro; Ohfuji, Takeshi; Endo, Masayuki; Morimoto, Hiroaki; Houlihan, Francis M.

No coin nor oath required. For personal study only.

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