✦ LIBER ✦

SPIE Proceedings [SPIE Microlithography 2003 - Santa Clara, CA (Sunday 23 February 2003)] Advances in Resist Technology and Processing XX - Influence of film thickness, molecular weight, and substrate on the physical properties of photoresist polymer thin films

✍ Scribed by Singh, Lovejeet; Ludovice, Peter J.; Henderson, Clifford L.; Fedynyshyn, Theodore H.

No coin nor oath required. For personal study only.

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