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SPIE Proceedings [SPIE Microlithography 2003 - Santa Clara, CA (Sunday 23 February 2003)] Advances in Resist Technology and Processing XX - Synthesis of novel fluorinated norbornene derivatives for 157-nm application

✍ Scribed by Koh, Meiten; Ishikawa, Takuji; Toriumi, Minoru; Araki, Takayuki; Yamashita, Tsuneo; Aoyama, Hirokazu; Yamazaki, Tamio; Furukawa, Takamitsu; Itani, Toshiro; Fedynyshyn, Theodore H.

Book ID: 121383112
Publisher: SPIE
Year: 2003
Weight: 300 KB
Volume: 5039
Category: Article
DOI: 10.1117/12.485077

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