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SPIE Proceedings [SPIE Microlithography 2003 - Santa Clara, CA (Sunday 23 February 2003)] Advances in Resist Technology and Processing XX - Fundamental study of photoresist dissolution with real time spectroscopic ellipsometry and interferometry

✍ Scribed by Burns, Sean D.; Schmid, Gerard M.; Trinque, Brian C.; Willson, James; Wunderlich, Jennifer; Tsiartas, Pavlos C.; Taylor, James C.; Burns, Ryan L.; Wilson, C. Grant; Fedynyshyn, Theodore H.

Book ID: 111967457
Publisher: SPIE
Year: 2003
Weight: 200 KB
Volume: 5039
Category: Article
DOI: 10.1117/12.485182

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