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SPIE Proceedings [SPIE Microlithography 2003 - Santa Clara, CA (Sunday 23 February 2003)] Advances in Resist Technology and Processing XX - Resist reflow for 193-nm low-K1 lithography contacts

✍ Scribed by Montgomery, Patrick K.; Lucas, Kevin; Strozewski, Kirk J.; Zavyalova, Lena; Grozev, Grozdan; Reybrouck, Mario; Tzviatkov, Plamen; Maenhoudt, Mireille; Fedynyshyn, Theodore H.

Book ID: 121084211
Publisher: SPIE
Year: 2003
Weight: 486 KB
Volume: 5039
Category: Article
DOI: 10.1117/12.485186

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