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SPIE Proceedings [SPIE Microlithography '99 - Santa Clara, CA (Sunday 14 March 1999)] Emerging Lithographic Technologies III - Reflectivity of Mo/Si multilayer systems for EUVL

✍ Scribed by Louis, Eric; Yakshin, Andrey E.; Goerts, Peter C.; Abdali, Salim; Maas, Edward L. G.; Stuik, R.; Bijkerk, Fred; Schmitz, Detlef; Scholze, Frank; Ulm, Gerhard; Haidl, Markus; Vladimirsky, Yuli

Book ID: 121380295
Publisher: SPIE
Year: 1999
Weight: 120 KB
Volume: 3676
Category: Article
DOI: 10.1117/12.351079

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