✦ LIBER ✦

SPIE Proceedings [SPIE SPIE's 27th Annual International Symposium on Microlithography - Santa Clara, CA (Sunday 3 March 2002)] Emerging Lithographic Technologies VI - Ultrahigh-accuracy measurement of the coefficient of thermal expansion for ultralow-expansion materials

✍ Scribed by Badami, Vivek G.; Linder, Michael; Engelstad, Roxann L.

No coin nor oath required. For personal study only.

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