SPIE Proceedings [SPIE SPIE's 27th Annual International Symposium on Microlithography - Santa Clara, CA (Sunday 3 March 2002)] Emerging Lithographic Technologies VI - Xenon target performance characteristics for laser-produced plasma EUV sources

✍ Scribed by Shields, Harry; Fornaca, Steven W.; Petach, Michael B.; Michaelian, Mark; McGregor, R. Daniel; Moyer, Richard H.; St. Pierre, Randall J.; Engelstad, Roxann L.

• Book ID: 121414384
• Publisher: SPIE
• Year: 2002
• Weight: 475 KB
• Volume: 4688
• Category: Article
• DOI: 10.1117/12.472266