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SPIE Proceedings [SPIE Microlithography '99 - Santa Clara, CA (Sunday 14 March 1999)] Advances in Resist Technology and Processing XVI - Design of a new bottom antireflective coating composition for KrF resist

✍ Scribed by Mizutani, Kazuyoshi; Momota, Makoto; Aoai, Toshiaki; Yagihara, Morio; Conley, Will


Book ID
120562279
Publisher
SPIE
Year
1999
Weight
792 KB
Volume
3678
Category
Article

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