Spectroscopic investigation of N2H2ArTiCl4-assisted chemical vapour deposition discharge for plasma of TiN

✍ Scribed by K.-T. Rie; J. Wöhle

• Publisher: Elsevier Science
• Year: 1991
• Tongue: English
• Weight: 245 KB
• Volume: 139
• Category: Article
• ISSN: 0921-5093
• DOI: 10.1016/0921-5093(91)90592-b

✦ Synopsis

The plasma-assisted chemical vapour deposition process for deposition of steel substrates with TiN layers was investigated by optical emission spectroscopy. Several atomic lines and molecular bands were identified in the emitted spectrum of the discharge. The nitrogen in the discharge was found mostly in a molecular state (N2* and N2+*). No bands of subchlorides of titanium and titanium nitride could be found in the spectrum. Titanium was identified in the ionized state. This Ti + intensity seems to be the controlling factor for layer growth.