✦ LIBER ✦

The adhesion of low pressure chemically vapour deposited tungsten films on silicon and SiO2 for SiH4H2WF6 and H2WF6 processes

✍ Scribed by Y.W. Park; C.O. Park; John S. Chun

No coin nor oath required. For personal study only.

📜 SIMILAR VOLUMES

Growth kinetics of low pressure chemical

✍ A.S Turtsevich; V.Y Krasnitsky; V.I Granko; V.P Lesnikova; I.V Smal; O.E Saryche 📂 Article 📅 1992 🏛 Elsevier Science 🌐 English ⚖ 918 KB

Low pressure chemical vapor deposition o

✍ H.L. Park; S.S. Yoon; C.O. Park; J.S. Chun 📂 Article 📅 1989 🏛 Elsevier Science 🌐 English ⚖ 412 KB