✦ LIBER ✦

Growth kinetics of low pressure chemically vapour deposited selective tungsten films in WF6Si and WF6H2 systems

✍ Scribed by A.S Turtsevich; V.Y Krasnitsky; V.I Granko; V.P Lesnikova; I.V Smal; O.E Sarychev; O.Y Nalivaiko; S.V Kravtsov

No coin nor oath required. For personal study only.

📜 SIMILAR VOLUMES

The adhesion of low pressure chemically

✍ Y.W. Park; C.O. Park; John S. Chun 📂 Article 📅 1991 🏛 Elsevier Science 🌐 English ⚖ 619 KB

Low pressure chemical vapor deposition o

✍ H.L. Park; S.S. Yoon; C.O. Park; J.S. Chun 📂 Article 📅 1989 🏛 Elsevier Science 🌐 English ⚖ 412 KB

Low temperature selective growth of epit

✍ M. Caymax; J. Poortmans; A. Van Ammel; M. Libezny; J. Nijs; R. Mertens 📂 Article 📅 1994 🏛 Elsevier Science 🌐 English ⚖ 449 KB