Effect of N2-to-TiCl4 flow rate ratio on the properties of TiN coatings formed by d.c. discharge plasma-assisted chemical vapor deposition

✍ Scribed by K. Oguri; H. Fujita; T. Arai

• Publisher: Elsevier Science
• Year: 1991
• Tongue: English
• Weight: 870 KB
• Volume: 195
• Category: Article
• ISSN: 0040-6090
• DOI: 10.1016/0040-6090(91)90260-5